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Die Bedeutung interferometerischerMesstechnik für die MikroOptik
Reinhard Völkel, Martin Eisner, Kenneth J. Weible
SUSS MicroOptics, Neuchâtel Schweiz
2www.suss-microoptics.cominfo@suss.ch
Warum ist Messtechnik für MikroOptik so wichtig?Warum Johannes für die MikroOptik so wichtig ist!!
4www.suss-microoptics.cominfo@suss.ch
1987: Der Optische Computer
! Am Rechenzentrum der Uni wurden die Lochkarten abgeschafft
! Prof. Lohmann fegte jeden vom Tennisplatz
! Speckles wurden noch ordentlich maskiert
! Willi feierte rauschende Feste am Geisberg
! Norbert kam von Bell Labs, Johannes vom ZOS
Wirklich prägend für diese Epoche war ein Bild →
Historisch interessant ist, dass sowohl beim optischen Computer als auch beidiesem Bild wichtige Details übersehen wurden.
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Holographische Linsen in Dichromatgelatine
Die Kombination optischer Computer und Holographie war unschlagbar!
Historisches Holo-Lab
488 nm → 633 nm
6www.suss-microoptics.cominfo@suss.ch
→ Spot-DiagrammWie vermisst man eine holographische Linse?
Messtechnik für Holographische Linsen?
nicht korrigiertkorrigiert
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Twyman-Green Interferometer ist bessere Lösung!
nicht korrigiert
korrigiert
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1995: Bill Hugle‘s Mikrolinsen-Lithographie
Bill Hugle
Patent 1992:„Lens Array Lithography“ Lösungsansatz:
+1 Abbildung mit invertiertemZwischenbild!
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h‘
h1Principle Ray
L1 L2
OBJ IMAG
Telescope I Telescope II
EL2EL1
Field Aperture
System Aperture
h1
h‘
h1h1Principle Ray
L1 L2
OBJ IMAG
Telescope I Telescope II
EL2EL1
Field Aperture
System Aperture
h1h1
1995: Bill Hugle‘s Mikrolinsen-Lithographie
Bill Hugle
Benfits:
• 0.8 mm working distance• large depth of focus• telecentric projection
Fully symmetic system
• no coma, astigmatism• telecentric imaging• aspheric microlenses
13www.suss-microoptics.cominfo@suss.ch
Karl Süss Neuchâtel - SUSS MicroOptics
1999 Reinraum für MikrolinsenproduktionØ200 mm Wafers (Quarz und Silizium)
2002 Gründung SUSS MicroOptics
SUSS RC8, ACS200SUSS DV13SUSS KT-22SUSS MA8SUSS MA/BA6SUSS DSM8STS-ICP
TWG-InterferometerMZ-InterferometerWyko NT3300Foothill KT-22
14www.suss-microoptics.cominfo@suss.ch
Our Products and Services
SUSS MicroOptics is a leading supplier for ! Refractive Microlens Arrays
! Fiber Collimators and Couplers
! Diffusers and Illumination Systems (from DUV to IR)
! Ultra-Flat Microlens Imaging Systems
SUSS MicroOptics offers ! Design of Micro-Optical Elements and Systems
! Manufacturing of Customer-Specific Micro-Optics
! Wafer-Level Packaging
! Testing and Inspection
15www.suss-microoptics.cominfo@suss.ch
Optical Design - Consulting
SUSS MicroOptics profits from more than 15 years experience in the design of optical elements (diffractive and refractive) and optical systems.
SUSS MicroOptics uses the following design tools
! SILVACO Expert, IC Layout Editor (Mask-Layout)! ZEMAX-EE, Optical Design Program! RAYTRACE, Optical Design Program! Simulated Annealing and Iterative Fourier Optimization for DOEs! Rigorous Diffraction Theory for Wave Propagation
SUSS MicroOptics works closely with top-ranking research groups worldwide to support our customers in developing and improving their products.
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Refractive Microlens Arrays
Standard Specifications! 200 mm wafer size, fused silica and silicon
! Lens profiles: spheres, aspheres (k = 0 to -8)
! Lens diameter typically 50 µm to 2 mm
! Lens sag up to 50 µm
! Numerical aperture from 0.02 to 0.8
Optional Features! Double sided arrays
! Stop arrays (masking of dead space by absorbing layer)
! AR-coating, dicing
! Wafer-Level Packaging
17www.suss-microoptics.cominfo@suss.ch
Testing and Inspection
Fizeau Interferometer for Wafer InspectionFlatness of wafer surfaces, parallelity front- and backside
Foothill Instruments KT-22, Film Thickness MetrologyUniformity of photoresist coatings
Phase Shifting Twyman-Green Interferometer (Schwider)Deviation from sphere or asphere, radius of curvature (ROC)
Phase Shifting Mach-Zehnder Interferometer (Schwider)Wave aberrations, focal length, NTF, PSF (wavelength 633nm)
Wyko NT3300 Surface Profiler, White Light InterferometerAutomatic full wafer testing for ROC, profile, surface roughness
SUSS MicroTec DSM-8, Double-Side Alignment TestAlignment accuracy of micro-optical structures front/backside, total system
18www.suss-microoptics.cominfo@suss.ch
Mach-Zehnder Interferometer: Strehl 0.99
Tested by Heidi Ottevaere, VUB - Lab for Photonics (TONA-TW),Brussel, BELGIUM
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Illumination Mask Aligner: Flat-Top Diffuser
Exposure OpticsEllipsoidal mirror
ShutterCondenser lens Light sensor
Mask & Wafer
Mirror
Diffractionred. Optics Front Lens
rrorCold light mi
Exposure OpticsEllipsoidal mirror
ShutterCondenser lens Light sensor
Mask & Wafer
Mirror
Diffractionred. Optics Front Lens
rrorCold light mi
Ellipsoidal mirrorEllipsoidal mirror
ShutterShutterCondenser lensCondenser lens Light sensorLight sensor
Mask & WaferMask & Wafer
MirrorMirror
Diffractionred. OpticsDiffractionred. Optics Front LensFront Lens
rrorCold light mirrorCold light mi
Far-field intensity (arbitrary units) distribution of aspherical microlens array as forseen for illumination within a Mask Aligner MPL
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Wafer-Level Packaging
" Automatic dispensing of UV-curing optical glue on wafer
" Precise alignment in x-y-z within SUSS Mask Aligner (∆x, ∆y ≈2 µm, ∆z ≈5 µm, ∆ϕ < 0.01°).
" UV-exposure within SUSS Mask Aligner
" Dicing of complete stack of wafers
21www.suss-microoptics.cominfo@suss.ch
Microlens Projection Lithography
SUSS MA150-MPL
Ultra-flat Microlens Projection Module
Extended Depth of Focus withNo Change of Critial Dimensions
22www.suss-microoptics.cominfo@suss.ch
Fiber Coupling
! Sender: laser or fiber array
! Receiver: detector or fiber array
! In-between: MOEMS, lens system, switch
! Coupling efficiency up to 100%, no crosstalk
! Relaxed tolerances (shift, tilt)
! Holes or posts on backside for fiber alignment
! Lens arrays, lateral position accuracy < 0.25 µm
Recommended